Engineered to provide unparalleled process control, safety, and consistency in Silicon Nitride etching

NB Series Silicon Nitride Etch Bath

• Seamless-molded, flame-polished 99.995% pure quartz vessel—ideal for ultra-pure chemistries
• PVDF refluxor condenses chemical vapors before they can escape from the bath, making it perfect for low flash-point chemicals or high-temperature operations
• Remote metering and DI water injection system compensates for boil-off to maintain consistent chemistry temperature and acid/water ratio
• Includes etch-foil resistance heater and vapor thermocouple (for chemical boiling control)
• 360° nitrogen-purged housing seal reduces acid penetration of heating element for extended service

The NB Series Silicon Nitride Etch Bath is ideal for etching silicon nitride layers in a heated process solution of phosphoric acid and DI water.

It heats the acid/water process solution to the process set point. Rather than injecting water once the set point is reached, it monitors the temperatures both of the solution and the vapor. As the process solution heats beyond its set point, DI water is injected into the process solution to replace water lost through vaporization. If either setting is not reached, as in the case of an open cover, an interlock prevents water injection.

Terra offers a comprehensive range of constant temperature baths, etching baths, and dump rinsers to meet other size and temperature requirements. Call to discuss your application.

Processing Modules
Model below accommodates a single 6" wafer cassett. Call Terra for other sizes. (Prices include installation)
	Cat. #	$/Each
Nb Series	7018-30	Login